CMOS Analog Design Using All-Region MOSFET Modeling by Márcio Cherem Schneider

By Márcio Cherem Schneider

Protecting the necessities of analog circuit layout, this publication takes a different layout method in response to a MOSFET version legitimate for all working areas, instead of the normal square-law version. beginning chapters specialize in machine modeling, built-in circuit know-how, and format, while later chapters move directly to hide noise and mismatch, and research and layout of the elemental development blocks of analog circuits, akin to present mirrors, voltage references, voltage amplifiers, and operational amplifiers. An advent to continuous-time filters can be supplied, as are the fundamental rules of sampled-data circuits, in particular switched-capacitor circuits. the ultimate bankruptcy then stories MOSFET types and describes ideas to extract layout parameters. With a number of layout examples and workouts additionally incorporated, this is often perfect for college students taking analog CMOS layout classes and in addition for circuit designers who have to shorten the layout cycle.

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2. 4. 1 Electrons and holes in semiconductors In equilibrium, electrons and holes in an ideal crystalline semiconductor behave as ideal gases when the doping concentration is not too high (typically of the order of 1018 cm− 3 or less), as is the case for the bulk material of MOS devices [3]. 38 × 10–23 J/K is the Boltzmann constant and T is the absolute temperature in degrees Kelvin (K). 6 × 10–19 C is the electronic charge. Because of their negative charge, electrons are attracted to regions of higher electric potential.

8. 5 The three-terminal MOS structure and the unified charge-control model (UCCM) The MOS transistor needs contact regions, which must be of a type opposite to that of the substrate, to access the inversion channel. 3 is an intermediate stage in the development of transistor models. 5), repeated below, but for the electrons their concentration is now controlled by  −VC instead of . Thus, q p ¼ p0 eÀkT ¼ p0 eÀu ; n ¼ n0 e qðÀVC Þ kT ¼ n0 euÀuC : 35 Advanced MOS transistor modeling VG VC n+ p-type substrate Fig.

Moschytz, and B. Gilbert, Boston, MA: Kluwer, 2002, pp. 7–74. Y. Tsividis, Mixed Analog–Digital VLSI Devices and Technology: An Introduction, New York: McGraw-Hill, 1996. M. , New York: Dover Publications, 1989. R. S. Muller and T. I. Kamins with M. , New York: John Wiley & Sons, 2003. P. R. Gray, P. J. Hurst, S. H. Lewis, and R. G. , New York: John Wiley & Sons, 2001. W. Shockley, M. Sparks, and G. K. Teal, “p–n Junction transistors,” Physical Review, vol. 83, no. 1, pp. 151–162, July 1, 1951.

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